The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2022
Filed:
Dec. 19, 2019
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Ralf Hofmann, Soquel, CA (US);
Majeed A. Foad, Sunnyvale, CA (US);
Cara Beasley, Scotts Valley, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/22 (2012.01); C23C 16/40 (2006.01); C23C 16/34 (2006.01); C03C 17/22 (2006.01); C03C 10/00 (2006.01); C03C 17/30 (2006.01); C03C 17/245 (2006.01);
U.S. Cl.
CPC ...
G03F 1/22 (2013.01); C03C 10/0027 (2013.01); C03C 17/22 (2013.01); C03C 17/245 (2013.01); C03C 17/30 (2013.01); C23C 16/345 (2013.01); C23C 16/401 (2013.01); C03C 2217/213 (2013.01); C03C 2218/152 (2013.01); C03C 2218/32 (2013.01);
Abstract
An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the glass-ceramic block; and depositing a planarization layer on the glass-ceramic substrate.