The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2017

Filed:

Apr. 24, 2015
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Ralf Hofmann, Soquel, CA (US);

Cara Beasley, Scotts Valley, CA (US);

Vinayak Vishwanath Hassan, Santa Clara, CA (US);

Majeed A. Foad, Sunnyvale, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); C23C 16/24 (2006.01); C23C 16/455 (2006.01); G03F 7/20 (2006.01); C23C 14/06 (2006.01); C23C 14/14 (2006.01); G21K 1/06 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0891 (2013.01); C23C 14/06 (2013.01); C23C 14/14 (2013.01); C23C 16/24 (2013.01); C23C 16/45525 (2013.01); G02B 5/0833 (2013.01); G02B 5/0875 (2013.01); G03F 7/7015 (2013.01); G03F 7/70316 (2013.01); G03F 7/70958 (2013.01); G21K 1/062 (2013.01); H05G 2/008 (2013.01); G21K 2201/067 (2013.01);
Abstract

An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.


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