The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 2025

Filed:

Aug. 16, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Akshay Dhanakshirur, Hubli, IN;

Juan Carlos Rocha-Alvarez, San Carlos, CA (US);

Kaushik Comandoor Alayavalli, Sunnyvale, CA (US);

Jay D. Pinson, Ii, San Jose, CA (US);

Rick Kustra, San Jose, CA (US);

Badri N. Ramamurthi, Los Gatos, CA (US);

Anup Kumar Singh, Santa Clara, CA (US);

Ganesh Balasubramanian, Fremont, CA (US);

Bhaskar Kumar, San Jose, CA (US);

Vinayak Vishwanath Hassan, San Francisco, CA (US);

Canfeng Lai, Fremont, CA (US);

Kallol Bera, Fremont, CA (US);

Sathya Swaroop Ganta, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); H01J 37/3244 (2013.01); H01J 37/32522 (2013.01); C23C 16/505 (2013.01); H01J 2237/3321 (2013.01);
Abstract

A lid for a process chamber includes a plate having a first surface and a second surface opposite the first surface. The first surface has a recess and a seal groove formed in the first surface and surrounding the recess. The lid further includes an array of holes extending from the recess to the second surface.


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