San Carlos, CA, United States of America

Juan Carlos Rocha-Alvarez

This inventor holds 165 USPTO granted patents and 62 published patent applications, primarily in Semiconductor Processing (CPC class C23C16-45565). Top assignees: Applied Materials, Inc., Applied Material, Inc., Other. Active years: 2003-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Juan Carlos Rocha-Alvarez. Retrieved from https://idiyas.com/inventor/juan-carlos-rocha-alvarez

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 165 

% Patents Active = 75.8

Average Co-Inventor Count = 5.6

ph-index = 17

Forward Citations = 2,965(Granted Patents)

Forward Citations (Not Self Cited) = 2,778(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Cupertino, CA (US) (2010)
  • Sunnyvale, CA (US) (2003 - 2013)
  • San Carlos, CA (US) (2010 - 2024)

Company Filing History:


Years Active: 2003-2026

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Areas of Expertise:
Electrostatic Chuck
Semiconductor Processing
Plasma Source
Substrate Support
Heat Transfer
Thermal Stability
Bipolar Design
Process Control
Fluid Delivery
Cleaning Methods
Faceplate Design
Real Time Correction
165 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Juan Carlos Rocha-Alvarez

Introduction:

In the realm of innovation and patents, it is important to highlight the exceptional work of inventors who have made significant contributions to their fields. One such innovator is Juan Carlos Rocha-Alvarez, based in San Carlos, CA (US). With an impressive portfolio of 131 patents, Rocha-Alvarez has made remarkable advancements in the field of semiconductor processing. Let's delve into his latest patents, career highlights, and collaborations to gain a deeper understanding of his achievements.

Latest Patents:

Rocha-Alvarez's latest patents showcase his expertise in developing substrate support assemblies and components. These assemblies include a platen designed to support semiconductor substrates while incorporating multiple stem sections and connectors. Through his inventions, Rocha-Alvarez has contributed to the development of more efficient and reliable substrate support systems in the semiconductor industry.

One of his patents addresses the issue of preventing bottom purge incursion in application volume and process gas diffusion below the heater in semiconductor processing chambers. By implementing innovative design elements such as a peripheral edge region, a pumping liner, a liner, and an edge ring, Rocha-Alvarez's invention ensures optimal gas circulation and enhanced performance in these chambers.

Career Highlights:

Juan Carlos Rocha-Alvarez has been associated with renowned companies like Applied Materials, Inc. and Applied Materials GmbH. During his tenure, he has contributed significantly to the advancement of semiconductor processing technologies. His vast experience and expertise have propelled him to the forefront of the industry, establishing his reputation as a leading innovator.

Collaborations:

In his professional endeavors, Rocha-Alvarez has worked alongside esteemed colleagues, including Jianhua Zhou and Ganesh Balasubramanian. These collaborations have fostered an environment of innovation, allowing for the exchange of ideas and the realization of groundbreaking inventions. Through collaborative efforts, Rocha-Alvarez has consistently pushed the boundaries of semiconductor processing technologies.

Conclusion:

Juan Carlos Rocha-Alvarez's extraordinary career and numerous patents in the field of semiconductor processing highlight his commitment to innovation and technological advancement. His latest patents, addressing critical aspects of substrate support assemblies and preventing gas diffusion, demonstrate his meticulous attention to detail and dedication to solving industry challenges. As an invaluable asset to companies like Applied Materials, Inc. and Applied Materials GmbH, Rocha-Alvarez's contributions continue to shape the landscape of the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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