The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Apr. 09, 2024
Applied Materials, Inc., Santa Clara, CA (US);
Jian Li, Fremont, CA (US);
Ganesh Balasubramanian, Fremont, CA (US);
Govindarajasekhar Singu, Santa Clara, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present disclosure provide an electrostatic chuck including a ring surrounding a top surface of the electrostatic chuck and a mesa extending along a diameter of the top surface of the electrostatic chuck such that the mesa contacts the ring on opposed ends thereof. The mesa is a single continuous feature. The mesa contacts a bottom surface of a substrate placed over the electrostatic chuck. The electrostatic chuck includes a first electrode and a second electrode. When a voltage is applied to the electrostatic chuck, an electric field is present between the first electrode and the second electrode. The mesa prevents the electric field from creating hatch marks on the top surface of the electrostatic chuck. The mesa is vertically offset from the first electrode and the second electrode or is vertically aligned with a gap defined between the first electrode and the second electrode.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile