The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Mar. 26, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jian Li, Fremont, CA (US);

Bryan Liao, Sunnyvale, CA (US);

Juan Carlos Rocha-Alvarez, San Carlos, CA (US);

Dmitry A. Dzilno, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01T 23/00 (2006.01); H10P 14/60 (2026.01); H10P 72/00 (2026.01); H10P 72/72 (2026.01);
U.S. Cl.
CPC ...
H10P 72/722 (2026.01); H10P 14/6336 (2026.01); H10P 72/0602 (2026.01);
Abstract

Electrostatic chucks (ESCs) are used to provide a clamping force between the substrate and the pedestal during semiconductor processes. However, it is difficult to measure a chucking state of the substrate during a live process, as this usually requires invasive measurements or additional hardware to be added to the pedestal. A new technique for monitoring a chucking state electrically isolates the ESC from the system ground to create a single conductive path through the ESC power supplies, ESC electrodes, and the substrate. A floating voltage between the two power supplies may change with the chucking state of the substrate, and this voltage may be monitored to determine the real-time chucking state of the substrate. This provides an unintrusive way to monitor the ESC state in real-time during a semiconductor process at the controller without disturbing the process or modifying the pedestal.


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