The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Nov. 02, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Rutvij Naik, San Jose, CA (US);
Vijay Sarthy Mysore Sreedhara, Redwood City, CA (US);
Xiaopu Li, San Jose, CA (US);
Shawyon Jafari, Sunnyvale, CA (US);
Chidambara A. Ramalingam, Fremont, CA (US);
Edward P. Hammond, Hillsborough, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Exemplary semiconductor processing chamber faceplates may include a body having a first surface and a second surface opposite the first surface. The body may define a plurality of apertures that extend through one or both of the first surface and the second surface. The faceplates may include a heater disposed within an interior of the body. The faceplates may include a first RF mesh disposed between the heater and the first surface. The faceplates may include a second RF mesh disposed between the heater and the second surface. The first RF mesh and the second RF mesh may be coupled together and form a Faraday cage about the heater.