The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Apr. 09, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Nitin Pathak, Mumbai, IN;

Vinay Prabhakar, Cupertino, CA (US);

Badri N. Ramamurthi, Los Gatos, CA (US);

Viren Kalsekar, Mountain View, CA (US);

Tuan A. Nguyen, San Jose, CA (US);

Juan Carlos Rocha-Alvarez, San Carlos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/455 (2006.01); C23C 16/54 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); H01L 21/67155 (2013.01); H01L 21/67167 (2013.01); H01L 21/6719 (2013.01); H01L 21/67196 (2013.01); H01L 21/67742 (2013.01); H01L 21/67757 (2013.01); H01L 21/68707 (2013.01); C23C 16/45519 (2013.01); C23C 16/54 (2013.01);
Abstract

Exemplary substrate processing systems may include a plurality of processing regions. The systems may include a transfer region housing defining a transfer region fluidly coupled with the plurality of processing regions. The systems may include a plurality of substrate supports, and each substrate support of the plurality of substrate supports may be vertically translatable between the transfer region and an associated processing region of the plurality of processing regions. The systems may include a transfer apparatus including a rotatable shaft extending through the transfer region housing. The transfer apparatus may include an end effector coupled with the rotatable shaft. The end effector may include a central hub defining a central aperture fluidly coupled with a purge source. The end effector may also include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports.


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