Vinay K Prabhakar

USPTO Granted Patents = 30 (Patent Applications = 19)

Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 25(Granted Patents)

Company Filing History:

24 out of 13,684

Applied Materials, Inc.

Years Active: 2016-2025

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30 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12424414 - Semiconductor processing system with a manifold for equal splitting and common divert architecture (2025-09-23),

2. 12400843 - Chamber configurations and processes for particle control (2025-08-26),

3. 12266550 - Multiple process semiconductor processing system (2025-04-01),

4. 12211728 - Electrostatic chuck design with improved chucking and arcing performance (2025-01-28),

5. 12191115 - Dual RF for controllable film deposition (2025-01-07),

6. 12136549 - Plasma-enhanced chemical vapor deposition of carbon hard-mask (2024-11-05),

7. 12000048 - Pedestal for substrate processing chambers (2024-06-04),

8. 11984305 - Substrate pedestal for improved substrate processing (2024-05-14),

9. 11875969 - Process chamber with reduced plasma arc (2024-01-16),

10. 11830706 - Heated pedestal design for improved heat transfer and temperature uniformity (2023-11-28),

11. 11682574 - Electrostatic chuck design with improved chucking and arcing performance (2023-06-20),

12. 11670492 - Chamber configurations and processes for particle control (2023-06-06),

13. 11600470 - Targeted heat control systems (2023-03-07),

14. 11587773 - Substrate pedestal for improved substrate processing (2023-02-21),

15. 11584994 - Pedestal for substrate processing chambers (2023-02-21),

Title: Vinay K Prabhakar: Innovator in Plasma Processing Technologies

Introduction

Vinay K Prabhakar is an esteemed inventor based in Cupertino, California, recognized for his significant contributions to the field of plasma processing technologies. With a portfolio of 27 patents, he has developed innovative solutions that enhance performance in various applications, particularly in substrate support and material deposition systems.

Latest Patents

Vinay's recent patents showcase his expertise in the design of advanced electrostatic chuck systems. One notable patent details an electrostatic chuck design with improved chucking and arcing performance. This innovative substrate support features a body with a support surface that partially supports a substrate, incorporating uniquely designed angled walls that enhance stability and performance.

Another of his latest patents presents a dual RF configuration for controllable film deposition in plasma processing systems. This system includes a showerhead and two RF generators which operate at different frequencies, enabling precise material deposition. The methods described in this patent also include the seasoning of processing chambers by depositing silicon oxide and silicon nitride to enhance overall efficiency.

Career Highlights

Throughout his career, Vinay has made significant strides while working with leading companies in the industry, including Applied Materials and Intevac. His innovative work in these organizations has been instrumental in advancing plasma processing technologies, leading to improved solutions for various applications.

Collaborations

Vinay has collaborated with several talented professionals, including his coworkers Abdul Aziz Khaja and Prashant Kumar Kulshreshtha. These collaborations have fostered an environment of shared innovation and have contributed to the successful development of new technologies in their field.

Conclusion

Vinay K Prabhakar is a notable inventor whose work has greatly impacted the field of plasma processing. His innovative patents and collaborations reflect his commitment to advancing technology and his dedication to solving complex challenges in material deposition and substrate support systems. As he continues to innovate, his contributions will undoubtedly inspire future developments in the industry.

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