The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Nov. 25, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Venkata Sharat Chandra Parimi, Sunnyvale, CA (US);
Xiaoquan Min, Cupertino, CA (US);
Zheng John Ye, Santa Clara, CA (US);
Prashant Kumar Kulshreshtha, San Jose, CA (US);
Vinay K Prabhakar, Cupertino, CA (US);
Lu Xu, San Jose, CA (US);
Kwangduk Douglas Lee, Redwood City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma processing system is described. The system may include a showerhead. The system may further include a first RF generator in electrical communication with the showerhead. The first RF generator may be configured to deliver a first voltage at a first frequency to the showerhead. Additionally, the system may include a second RF generator in electrical communication with a pedestal. The second RF generator may be configured to deliver a second voltage at a second frequency to the pedestal. The second frequency may be less than the first frequency. The system may also include a terminator in electrical communication with the showerhead. The terminator may provide a path to ground for the second voltage. Methods of depositing material using the plasma processing system are described. A method of seasoning a chamber by depositing silicon oxide and silicon nitride on the wall of the chamber is also described.