The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Oct. 13, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Vellaichamy Nagappan, Ramanathapuram, IN;
Viren Kalsekar, Sunnyvale, CA (US);
Vinay K. Prabhakar, Fremont, CA (US);
Siva Chandrasekar, Hosur, IN;
Satish Radhakrishnan, San Jose, CA (US);
Rajath Kumar Lakkenahalli Hiriyannaiah, Bengaluru, IN;
Dharma Ratnam Srichurnam, Hyderabad, IN;
Sumit Subhash Singh, Mumbai, IN;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a substrate support assembly disposed within the chamber body. The chambers may include a substrate support assembly having a support plate seated atop a support stem. The chambers may include a radio frequency (RF) shield seated atop the chamber body and extending about a peripheral edge of the support plate. The RF shield may include a lower annular member. The RF shield may include an upper annular member seated atop the lower annular member. The upper annular member may define a lip that protrudes radially outward from an outer surface of the upper annular member. Each of the lower annular member and the upper annular member may include a dielectric material.