Rajath Kumar Lakkenahalli Hiriyannaiah

Title: Rajath Kumar Lakkenahalli Hiriyannaiah: Innovator in Substrate Processing Systems

Introduction

Rajath Kumar Lakkenahalli Hiriyannaiah is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of substrate processing systems, showcasing his innovative spirit through his patented inventions. His work is characterized by a focus on enhancing the efficiency and functionality of processing systems.

Latest Patents

Rajath holds a patent for "Thermally controlled lid stack components." This invention involves exemplary substrate processing systems that include a chamber body defining a transfer region. The systems feature a lid plate seated on the chamber body, which defines a first plurality of apertures and a second plurality of apertures. Additionally, the systems incorporate a plurality of lid stacks equal to the number of apertures of the first plurality defined through the lid plate. Each lid stack includes a choke plate that is seated on the lid plate, with apertures aligned with the respective apertures of the lid plate.

Career Highlights

Rajath is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the field of substrate processing. His work has been instrumental in advancing technologies that are crucial for various applications in the semiconductor industry.

Collaborations

Some of his notable coworkers include Siva Chandrasekar and Satish Radhakrishnan, who contribute to a collaborative environment that fosters innovation and creativity.

Conclusion

Rajath Kumar Lakkenahalli Hiriyannaiah exemplifies the spirit of innovation through his contributions to substrate processing systems. His patent reflects a commitment to advancing technology in the semiconductor industry, and his work continues to inspire future innovations.