Dharma Ratnam Srichurnam

Title: Innovations of Dharma Ratnam Srichurnam

Introduction

Dharma Ratnam Srichurnam is a notable inventor based in Karnataka, India. He has made significant contributions to the field of semiconductor processing, holding a total of four patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing systems.

Latest Patents

One of his latest patents is a semiconductor processing system with a manifold for equal splitting and common divert architecture. This exemplary substrate processing system includes a lid plate and a gas splitter seated on the lid plate. The gas splitter features a top surface and side surfaces, defining first and second gas inlets and outlets. It also includes gas lumens that fluidly couple each gas inlet with corresponding gas outlets, along with mixing channels for optimal gas distribution. Another significant patent involves cleaning assemblies for substrate processing chambers. This cleaning assembly comprises a distribution ring with an inlet and outlet, fluidly coupled to the internal volume of the substrate processing chamber. The assembly is designed to divert a portion of cleaning fluid from the gas manifold to the distribution ring, ensuring effective cleaning processes.

Career Highlights

Dharma Ratnam Srichurnam is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His innovative work has contributed to advancements in substrate processing technologies, making him a valuable asset to his organization.

Collaborations

He has collaborated with notable coworkers such as Subramaniam V Iyer and Devendrappa Holeyannavar, further enhancing the innovative environment at Applied Materials, Inc.

Conclusion

Dharma Ratnam Srichurnam's contributions to semiconductor processing through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in technology and processing systems.