Company Filing History:
Years Active: 2021-2022
Title: Siva Chandrasekar: Innovator in Substrate Processing Systems
Introduction
Siva Chandrasekar is a notable inventor based in Hosur, India. He has made significant contributions to the field of substrate processing systems, holding a total of 3 patents. His work focuses on enhancing the efficiency and functionality of various components used in these systems.
Latest Patents
One of Siva's latest patents is for thermally controlled lid stack components. This exemplary substrate processing system includes a chamber body that defines a transfer region. The system features a lid plate seated on the chamber body, which defines a first plurality of apertures and a second plurality of apertures. Additionally, the system comprises a plurality of lid stacks that correspond to the number of apertures in the first plurality. Each lid stack includes a choke plate that is aligned with the apertures, enhancing the system's performance.
Another innovative patent involves fabricating a recursive flow gas distribution stack using multiple layers. This method begins with receiving parameters associated with a plurality of metal plates. Based on these parameters, predicted deformation values for each metal plate are determined. The method then facilitates the diffusion bonding of the metal plates to create a bonded metal plate structure, showcasing Siva's expertise in material science and engineering.
Career Highlights
Siva Chandrasekar is currently employed at Applied Materials, Inc., where he continues to develop cutting-edge technologies in substrate processing. His work has been instrumental in advancing the capabilities of the systems used in various applications.
Collaborations
Siva collaborates with talented individuals such as Sumit Agarwal and Anantha K Subramani. Their combined expertise fosters an environment of innovation and creativity, leading to groundbreaking advancements in their field.
Conclusion
Siva Chandrasekar's contributions to substrate processing systems through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced technologies that enhance efficiency and performance.
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