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Jay D Pinson, Ii

This inventor holds 54 USPTO granted patents and 11 published patent applications, primarily in Plasma Processing. Top assignees: Applied Materials, Inc., Lifeline Tech, Inc., Sokudo Co., Ltd.. Active years: 1983-2026.

USPTO Granted Patents = 54 (Patent Applications = 11)

% Patents Active = 75.9

Average Co-Inventor Count = 5.7

ph-index = 18

Forward Citations = 1,802(Granted Patents)

Forward Citations (Not Self Cited) = 1,743(Dec 10, 2025)

Company Filing History:

51 out of 14,433

Applied Materials, Inc.

4. 1 out of 834,453

Other

patents

Years Active: 1983-2026

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Areas of Expertise:

Chamber Cleaning

Temperature Control

Gas Distribution

Electrostatic Chuck

Plasma Processing

Remote Plasma Source

CVD

Magnetic Shielding

Ozone Cure

Cluster Tool Architecture

Substrate Processing

Metrology Design

54 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12731771 - Lower deposition chamber CCP electrode cleaning solution (2026-09-08),

2. 12606907 - Method and apparatus with high conductance components for chamber cleaning (2026-04-21),

3. 12460298 - Showerhead design to control stray deposition (2025-11-04),

4. 12322633 - Electrostatic chuck with improved temperature control (2025-06-03),

5. 12203171 - Batch curing chamber with gas distribution and individual pumping (2025-01-21),

6. 11984302 - Magnetic-material shield around plasma chambers near pedestal (2024-05-14),

7. 11495454 - Deposition of low-stress boron-containing layers (2022-11-08),

8. 11408075 - Batch curing chamber with gas distribution and individual pumping (2022-08-09),

9. 11404263 - Deposition of low-stress carbon-containing layers (2022-08-02),

10. 11276562 - Plasma processing using multiple radio frequency power feeds for improved uniformity (2022-03-15),

11. 10984990 - Electrode assembly (2021-04-20),

12. 10934620 - Integration of dual remote plasmas sources for flowable CVD (2021-03-02),

13. 10916407 - Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates (2021-02-09),

14. 10663491 - Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same (2020-05-26),

15. 10580623 - Plasma processing using multiple radio frequency power feeds for improved uniformity (2020-03-03),

Title: Innovator Spotlight: Jay D Pinson, II – Pioneering Advancements in Batch Processing Chambers

Introduction: Jay D Pinson, II is a prominent inventor based in San Jose, CA, renowned for his significant contributions to the field of technology, particularly in the area of semiconductor manufacturing. With an impressive portfolio of 50 patents, his innovations have shaped how industries utilize batch processing techniques.

Latest Patents: Among his latest inventions, Jay has developed a "Batch Curing Chamber with Gas Distribution and Individual Pumping." This patent describes a batch processing chamber designed to simultaneously cure multiple substrates, featuring independently temperature-controlled sub-regions and innovative transport methods. Another noteworthy patent is for a "Magnetic-Material Shield Around Plasma Chambers Near Pedestal," which enhances the performance of plasma chambers by encapsulating the processing region with a magnetic-material shield to optimize substrate support.

Career Highlights: Jay D Pinson, II has worked for several esteemed companies throughout his career. Notably, he has held positions at Applied Materials, Inc. and Sokudo Co., Ltd., where he made substantial contributions to technology development and innovation. His expertise in semiconductor manufacturing has positioned him as a leader in the advancement of processing equipment.

Collaborations: Throughout his journey, Jay has collaborated with notable professionals in the industry, including Tetsuya Ishikawa and Kenneth S Collins. Their collective efforts in research and development have resulted in groundbreaking innovations that have impacted the field significantly.

Conclusion: Jay D Pinson, II exemplifies the spirit of innovation through his dedication and numerous patents in the semiconductor industry. His work continues to influence the future of substrate processing technologies, making him a remarkable figure in the realm of inventions and a valuable asset to the companies he has been a part of.

Profile summary based on public USPTO records.

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