The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Dec. 11, 2003
Toshio Masuda, Toride, JP;
Tatehito Usui, Niihari, JP;
Mitsuru Suehiro, Kudamatsu, JP;
Hiroshi Kanekiyo, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Kazue Takahashi, Kudamatsu, JP;
Hiromichi Enami, Tachikawa, JP;
Toshio Masuda, Toride, JP;
Tatehito Usui, Niihari, JP;
Mitsuru Suehiro, Kudamatsu, JP;
Hiroshi Kanekiyo, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Kazue Takahashi, Kudamatsu, JP;
Hiromichi Enami, Tachikawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing apparatus having a sample stage disposed inside a vacuum chamber and a plate member disposed opposing to a sample which is placed on the sample stage and supplied with electric power. The sample is processed using a plasma generated between the sample stage and the plate member and a measuring port is disposed at a back side of the plate member. The measuring port includes an optical transmitter which receives light from a surface of the sample, and a seal which vacuum-seals between an atmospheric side and vacuum side of the vacuum chamber.