Tachikawa, Japan

Hiromichi Enami

This inventor holds 26 USPTO granted patents and 2 published patent applications, primarily in Plasma Processing. Top assignees: Hitachi, Ltd., Hitachi Vlsi Engineering Corp., Hitachi Ulsi Engineering Corp.. Active years: 1990-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiromichi Enami. Retrieved from https://idiyas.com/inventor/hiromichi-enami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 80.8

Average Co-Inventor Count = 8.6

ph-index = 11

Forward Citations = 585(Granted Patents)


Location History:

  • Kudamatsu, JP (2009)
  • Tachikawa, JP (1990 - 2010)

Company Filing History:


Years Active: 1990-2010

Loading Chart...
Areas of Expertise:
Plasma Processing
Semiconductor Integrated Circuit
Etching Method
Foreign Material Detection
Sample Processing
Fabrication Apparatus
Plasma Generator
Damage Removal
Passivation Layer
Mode Restricting Means
Equipment for Plasma Processing
Transition-Metal Film
26 patents (USPTO):Explore Patents

Title: **Hiromichi Enami: A Pioneer in Plasma Processing Technology**

Introduction

Hiromichi Enami, located in Tachikawa, Japan, has made significant contributions to the field of plasma processing technology through his innovative inventions. With a remarkable portfolio of 26 patents, Enami continues to push the boundaries of technological advancements in this specialized domain.

Latest Patents

Among his latest patents, two notable innovations stand out. The first patent is a "Plasma Processing System and Apparatus," which describes a vacuum vessel equipped with a sample stage in a process chamber. This apparatus features a plate with uniform thickness, applied electric power, and a through-hole for light transmission. An optical transmitter is positioned within the vacuum vessel to receive light through the hole, facilitating advanced processing capabilities.

The second innovation is the "Device and Method for Detecting Foreign Material on the Surface of Plasma Processing Apparatus." This patent introduces a detection technique that accurately measures foreign materials on plasma processing apparatus surfaces. The detection device employs a gauge head capable of blowing a gas to extract particles, along with a particle counter that continuously monitors the foreign materials collected. This innovative approach enhances the efficiency of plasma processing by ensuring purity in the operational environment.

Career Highlights

Hiromichi Enami has accumulated a wealth of experience through his work with prominent companies. He has been associated with Hitachi, Ltd. and Hitachi VLSI Engineering Corporation, where he has played crucial roles in the development of cutting-edge technologies. His endeavors in these organizations have paved the way for his numerous inventions and patents, showcasing his expertise in plasma processing.

Collaborations

Throughout his career, Enami has collaborated with notable colleagues, including Osamu Kasahara and Yoshinao Kawasaki. These partnerships have fostered a creative environment that stimulates innovation, allowing them to tackle complex engineering challenges and contribute to the advancements in their respective fields.

Conclusion

Hiromichi Enami's contributions to plasma processing technology illustrate the power of innovation in enhancing industrial capabilities. His extensive patent portfolio, along with his impactful collaborations, underlines his role as a leading inventor in this field. As technology continues to evolve, his work remains a cornerstone for advancements in plasma processing and its applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…