The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2005
Filed:
Dec. 11, 2003
Toshio Masuda, Toride, JP;
Tatehito Usui, Niihari, JP;
Mitsuru Suehiro, Kudamatsu, JP;
Hiroshi Kanekiyo, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Kazue Takahashi, Kudamatsu, JP;
Hiromichi Enami, Tachikawa, JP;
Toshio Masuda, Toride, JP;
Tatehito Usui, Niihari, JP;
Mitsuru Suehiro, Kudamatsu, JP;
Hiroshi Kanekiyo, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Kazue Takahashi, Kudamatsu, JP;
Hiromichi Enami, Tachikawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing apparatus having a sample bench located in a vacuum chamber, a structure disposed at a position opposed to a sample placed on the sample bench and facing a plasma generated in the vacuum chamber, and at least one through-hole disposed in the structure through which a gas flows into the vacuum chamber. An optical transmitter is mounted on a back of the at least one through-hole through which light from the sample passes, which light is detected by way of the optical transmitter.