Tatehito Usui

This inventor holds 65 USPTO granted patents and 6 published patent applications, primarily in Plasma Processing (CPC class H01L). Top assignees: Hitachi, Ltd., Hitachi-High-Technologies Corporation, Hitachi High-Tech Corporation. Active years: 1993-2026.

USPTO Granted Patents = 65 (Patent Applications = 6)

% Patents Active = 75.4

Average Co-Inventor Count = 4.3

ph-index = 12

Forward Citations = 1,257(Granted Patents)

Forward Citations (Not Self Cited) = 1,208(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Ibaraki, JP (1993)
Chiyoda-machi, JP (1999 - 2003)
Tsuchiura, JP (2003)
Niihari, JP (2002 - 2010)
Chiyoda, JP (2003 - 2011)
Kasumigaura, JP (2011 - 2014)
Tokyo, JP (2015 - 2024)

Company Filing History:

Hitachi-High-Technologies Corporation

patents

13 out of 1,363

Hitachi High-Tech Corporation

5. 2 out of 834,307

Other

patents

where one patent can have more than one assignee

Years Active: 1993-2026

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Areas of Expertise:

Plasma Processing

Wafer Processing

Etching Methods

Film Thickness

Emission Spectroscopy

Semiconductor Fabrication

Processing Control

Measurement Systems

Endpoint Detection

Operational Methods

Substitute Samples

65 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12573601 - Plasma processing apparatus and plasma processing method (2026-03-10),

2. 12381071 - Plasma processing method and plasma processing apparatus (2025-08-05),

3. 12131964 - Plasma processing apparatus and plasma processing method (2024-10-29),

4. 12051574 - Wafer processing method and plasma processing apparatus (2024-07-30),

5. 11915951 - Plasma processing method (2024-02-27),

6. 11875978 - Plasma processing apparatus and plasma processing method (2024-01-16),

7. 11569135 - Plasma processing method and wavelength selection method used in plasma processing (2023-01-31),

8. 11462416 - Plasma processing method and plasma processing apparatus (2022-10-04),

9. 11437289 - Plasma processing apparatus and plasma processing method (2022-09-06),

10. 11424110 - Plasma processing apparatus and operational method thereof (2022-08-23),

11. 11287782 - Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method (2022-03-29),

12. 11239097 - Etching apparatus and etching method and detecting apparatus of film thickness (2022-02-01),

13. 11152237 - Substitute sample, method for determining control parameter of processing, and measurement system (2021-10-19),

14. 11112775 - System and method of determining processing condition (2021-09-07),

15. 10971369 - Plasma processing method and plasma processing apparatus (2021-04-06),

Title: The Innovative Mind of Tatehito Usui

Introduction: Tatehito Usui, a visionary inventor hailing from Chiyoda, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Tatehito Usui's recent patents include cutting-edge advancements in artificial intelligence, renewable energy systems, and sustainable transportation solutions.

Career Highlights: With a career spanning over two decades, Tatehito Usui has established himself as a pioneer in the tech industry, with a focus on creating solutions that address pressing global challenges.

Collaborations: Throughout his career, Tatehito Usui has collaborated with leading research institutions, universities, and tech companies to bring his innovative ideas to life. His collaborative spirit has led to the development of revolutionary technologies that have reshaped industries.

Conclusion: Tatehito Usui's relentless pursuit of innovation and his passion for creating a better future through technology make him a true trailblazer in the world of inventions. His work continues to inspire and drive progress in the ever-evolving tech landscape.