The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Apr. 30, 2018
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Takeshi Ohmori, Tokyo, JP;

Hyakka Nakada, Tokyo, JP;

Masaru Kurihara, Tokyo, JP;

Tatehito Usui, Tokyo, JP;

Naoyuki Kofuji, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/04 (2006.01); G06F 17/18 (2006.01); G06N 20/00 (2019.01); G05B 13/02 (2006.01); G06F 30/20 (2020.01);
U.S. Cl.
CPC ...
G05B 13/041 (2013.01); G05B 13/0265 (2013.01); G06F 17/18 (2013.01); G06F 30/20 (2020.01); G06N 20/00 (2019.01);
Abstract

A computer for determining a control parameter of processing to be performed on a sample includes: a memory unit configured to store a first model indicating a correlation between a first processing output obtained by measuring a first sample used for manufacturing, on which the processing is performed and a second processing output obtained by measuring a second sample that is easier to measure than the first sample and on which the processing is performed, and a second model indicating a correlation between a control parameter of the processing performed on the second sample and the second processing output; and an analysis unit configured to calculate a target control parameter of the processing performed on the first sample based on a target processing output as the target first processing output, the first model, and the second model.


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