logo

For the Inventor, By the Inventor

Tama, Japan

Naoyuki Kofuji

This inventor holds 30 USPTO granted patents and 10 published patent applications, primarily in Plasma Processing. Top assignees: Hitachi-High-Technologies Corporation, Hitachi, Ltd., Hitachi High-Tech Corporation. Active years: 2001-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoyuki Kofuji. Retrieved from https://idiyas.com/inventor/naoyuki-kofuji

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 30 

% Patents Active = 76.7

Average Co-Inventor Count = 3.4

ph-index = 6

Forward Citations = 94(Granted Patents)


Location History:

  • Naka-1-chome, Kunitachi-shi, JP (2001)
  • Kunitachi, JP (2001)
  • Tama, JP (2002 - 2018)
  • Tokyo, JP (2008 - 2024)

Company Filing History:

goldMedal12 out of 2,874 
 
Hitachi-High-Technologies Corporation
 patents
silverMedal11 out of 42,743 
 
Hitachi, Ltd.
 patents
bronzeMedal3 out of 1,398 
 
Hitachi High-Tech Corporation
 patents
4. 2 out of 1,458 
 
Elpida Memory, Inc.
 patents
5. 1 out of 1,112 
 
Hitachi Maxell, Limited
 patents
6. 1 out of 992 
 
Maxell, Ltd.
 patents
7. 1 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 2001-2024

Loading Chart...
Areas of Expertise:
Plasma Processing
Etching Method
Semiconductor Manufacturing
Optical Device
Control Parameter
Measurement System
Surface Treatment
Pressure Control
30 patents (USPTO):Explore Patents
1. 11915951 - Plasma processing method (2024-02-27),
2. 11398371 - Plasma processing apparatus (2022-07-26),
3. 11287782 - Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method (2022-03-29),
4. 11189470 - Search device, search method and plasma processing apparatus (2021-11-30),
5. 11152237 - Substitute sample, method for determining control parameter of processing, and measurement system (2021-10-19),
6. 10418254 - Etching method and etching apparatus (2019-09-17),
7. 10418224 - Plasma etching method (2019-09-17),
8. 10310321 - Optical element, manufacturing method of optical element, and optical device (2019-06-04),
9. 9997337 - Plasma processing method and plasma processing apparatus (2018-06-12),
10. 9960014 - Plasma etching method (2018-05-01),
11. 9933553 - Optical element and optical device (2018-04-03),
12. 9099349 - Semiconductor device manufacturing method (2015-08-04),
13. 9076637 - Plasma processing method and plasma processing apparatus (2015-07-07),
14. 8791027 - Method of manufacturing semiconductor device (2014-07-29),
15. 8546266 - Plasma processing method and plasma processing apparatus (2013-10-01),

Title: The Innovative Journey of Naoyuki Kofuji

Introduction: Naoyuki Kofuji is a renowned inventor hailing from Tama, Japan. His groundbreaking work in the field of technology has earned him a well-deserved reputation as a pioneer in the industry.

Latest Patents: Naoyuki Kofuji holds several patents in the realm of electronics and telecommunications, showcasing his continuous dedication to innovation and advancement in these areas.

Career Highlights: With a career spanning over two decades, Naoyuki Kofuji has worked tirelessly to push the boundaries of what is possible in the tech world. His contributions have not only revolutionized existing technologies but have also paved the way for future developments.

Collaborations: Throughout his career, Naoyuki Kofuji has collaborated with leading tech companies and research institutions to bring his ideas to life. His ability to work seamlessly with others has led to the creation of groundbreaking products that have changed the way we interact with technology.

Conclusion: Naoyuki Kofuji's passion for innovation and his relentless drive to create have solidified his position as a trailblazer in the world of technology. His work continues to inspire generations of inventors and serves as a testament to the power of creativity and perseverance in the face of challenges.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…