The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Dec. 16, 2020
Hitachi High-tech Corporation, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
The plasma processing device according to the present invention includes a processing chamber in which a sample is plasma processed, a radio frequency power supply which supplies radio frequency power for generating plasma, and a sample stand on which the sample is placed. The plasma processing device includes a control device which measures a thickness of a protective film selectively formed on a desired material of the sample using an interference light reflecting from the sample which has been irradiated with an ultraviolet-ray, or determines selectivity of the protective film using the interference light reflecting from the sample which has been irradiated with the ultraviolet-ray.