Miyako Matsui

Title: The Innovative Contributions of Miyako Matsui

Introduction

Miyako Matsui is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of plasma processing technology, holding a total of nine patents. Her work has been instrumental in advancing the efficiency and effectiveness of plasma etching methods used in various applications.

Latest Patents

Miyako Matsui's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus is designed to perform plasma etching on a wafer that has a multilayer film composed of an insulating film and a metal-containing film. This apparatus features a processing chamber within a vacuum container, a sample stage for placing the wafer, a detection unit for monitoring reflected light, a control unit for managing plasma processing, and an end point determination unit that identifies when to stop the etching process based on changes in light spectrum amplitude. The plasma processing method involves selectively forming a protective film on a sample's pattern and adjusting its width to achieve a desired distribution before proceeding with plasma etching.

Career Highlights

Miyako Matsui has had a distinguished career, working with notable companies such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. Her experience in these organizations has allowed her to develop and refine her innovative ideas in plasma processing technology.

Collaborations

Miyako has collaborated with esteemed colleagues, including Tatehito Usui and Kenichi Kuwahara. These partnerships have contributed to her success and the advancement of her research.

Conclusion

Miyako Matsui's contributions to plasma processing technology exemplify her innovative spirit and dedication to her field. Her patents and career achievements highlight her role as a leading inventor in Japan.