The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 2017
Filed:
May. 25, 2011
Hiroki Kawada, Tsuchiura, JP;
Osamu Inoue, Kodaira, JP;
Miyako Matsui, Kokubunji, JP;
Takahiro Kawasaki, Omitama, JP;
Naoshi Itabashi, Hachioji, JP;
Takashi Takahama, Higashimurayama, JP;
Katsumi Setoguchi, Hitachinaka, JP;
Osamu Komuro, Hitachinaka, JP;
Hiroki Kawada, Tsuchiura, JP;
Osamu Inoue, Kodaira, JP;
Miyako Matsui, Kokubunji, JP;
Takahiro Kawasaki, Omitama, JP;
Naoshi Itabashi, Hachioji, JP;
Takashi Takahama, Higashimurayama, JP;
Katsumi Setoguchi, Hitachinaka, JP;
Osamu Komuro, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An object of the present invention is to provide an image processing apparatus that quickly and precisely measures or evaluates a distortion in a field of view and a charged particle beam apparatus. To attain the object, an image processing apparatus or the like is proposed which acquires a first image of a first area of an imaging target and a second image of a second area that is located at a different position than the first area and partially overlaps with the first area and determines the distance between a measurement point in the second image and a second part of the second image that corresponds to a particular area for a plurality of sites in the overlapping area of the first image and the second image.