This inventor holds 7 USPTO granted patents. Top assignees: Hitachi, Ltd., Hitachi-High-Technologies Corporation. Active years: 1982-2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1982-2010
Title: Hiroshi Kanekiyo: Innovator in Plasma Processing Technology
Introduction
Hiroshi Kanekiyo is a prominent inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing, holding a total of 7 patents. His innovative work has advanced the technology used in various industrial applications.
Latest Patents
One of his latest patents is a plasma processing system and apparatus, which includes a vacuum vessel with a sample stage. This sample stage has a mounting surface located within a process chamber. The apparatus features a plate with a uniform thickness, which is positioned opposite and parallel to the sample stage. This plate serves as the ceiling of the chamber and has a through-hole for light transmission. An optical transmitter, larger than the through-hole, is placed inside the vacuum vessel to receive light from the chamber. This design allows for efficient processing and measurement of samples using plasma technology.
Another notable patent by Kanekiyo involves a plasma processing apparatus that includes a sample stage within a vacuum chamber. The apparatus features a plate member that opposes the sample placed on the stage, which is supplied with electric power. Plasma is generated between the sample stage and the plate member, facilitating the processing of the sample. A measuring port located at the back of the plate member includes an optical transmitter that captures light from the sample's surface, ensuring accurate measurements.
Career Highlights
Hiroshi Kanekiyo has worked with renowned companies such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to develop and refine his expertise in plasma processing technologies.
Collaborations
Throughout his career, Kanekiyo has collaborated with notable colleagues, including Mitsuru Suehiro and Toshio Masuda. These partnerships have contributed to the advancement of his research and innovations in the field.
Conclusion
Hiroshi Kanekiyo's contributions to plasma processing technology have established him as a key figure in the industry. His innovative patents and collaborations reflect his commitment to advancing scientific knowledge and practical applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile