The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Jul. 19, 2007
Toshio Masuda, Toride, JP;
Tatehito Usui, Niihari, JP;
Mitsuru Suehiro, Kudamatsu, JP;
Hiroshi Kanekiyo, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Kazue Takahashi, Kudamatsu, JP;
Hiromichi Enami, Tachikawa, JP;
Toshio Masuda, Toride, JP;
Tatehito Usui, Niihari, JP;
Mitsuru Suehiro, Kudamatsu, JP;
Hiroshi Kanekiyo, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Kazue Takahashi, Kudamatsu, JP;
Hiromichi Enami, Tachikawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing apparatus includes a vacuum vessel with a sample stage having a mounting surface disposed in a process chamber, and a plate having substantially uniform thickness and electric power applied thereto constituting a ceiling of the chamber. The plate is disposed opposite to and substantially parallel with the sample stage so as to cover the whole area of the stage mounting surface and has a through-hole therein. An optical transmitter with a diameter larger than a diameter of the though-hole is disposed inside of the vacuum vessel and has an end face at a position above and spaced a small distance a back surface of the plate so as to receive light from the chamber via the through-hole. The optical transmitter is independently detachable with respect to the back surface of the plate.