Company Filing History:
Years Active: 2001-2010
Title: Mitsuru Suehiro: Innovator in Plasma Processing Technology
Introduction
Mitsuru Suehiro is a prominent inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing, holding a total of 12 patents. His innovative work has advanced the technology used in various industrial applications.
Latest Patents
One of Mitsuru Suehiro's latest patents is a plasma processing system and apparatus, which includes a vacuum vessel with a sample stage. This sample stage has a mounting surface located within a process chamber. The apparatus features a plate with a uniform thickness, which is electrically powered and serves as the ceiling of the chamber. This plate is positioned opposite and parallel to the sample stage, covering the entire area of the mounting surface and includes a through-hole. An optical transmitter, larger than the through-hole, is located inside the vacuum vessel, allowing it to receive light from the chamber through the hole. The optical transmitter is designed to be independently detachable from the back surface of the plate.
Another notable patent by Suehiro involves a plasma processing apparatus that has a sample stage within a vacuum chamber. This apparatus includes a plate member that opposes the sample placed on the stage and is supplied with electric power. Plasma is generated between the sample stage and the plate member to process the sample. Additionally, a measuring port is located at the back of the plate member, which contains an optical transmitter that captures light from the sample's surface, along with a seal that maintains the vacuum within the chamber.
Career Highlights
Mitsuru Suehiro has worked with notable companies such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to develop and refine his expertise in plasma processing technologies.
Collaborations
Some of Mitsuru Suehiro's coworkers include Kazue Takahashi and Toshio Masuda. Their collaboration has contributed to the advancement of innovative technologies in their field.
Conclusion
Mitsuru Suehiro's work in plasma processing technology has led to significant advancements and numerous patents. His contributions continue to influence the industry and inspire future innovations.