The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2003
Filed:
Sep. 06, 2001
Seiichiro Kanno, Chiyoda, JP;
Hironobu Kawahara, Kudamatsu, JP;
Mitsuru Suehiro, Kudamatsu, JP;
Saburo Kanai, Hikari, JP;
Ken Yoshioka, Hikari, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A wafer stage for holding a semiconductor wafer in a plasma treatment apparatus by setting the wafer on the wafer stage, said wafer stage comprising a base material equipped with refrigerant flow paths for allowing a refrigerant for temperature adjustment to flow; a stress-reducing member provided on the wafer setting side of said base material and having a smaller thermal expansion coefficient than does said base material; a dielectric film provided on the wafer setting side of said stress-reducing member; and a deflection-preventing member provided on the wafer non-setting side of said base material and having a smaller thermal expansion coefficient than does said base material. When the wafer stage is used, the temperature of the wafer as a substrate to be processed can be controlled uniformly and very accurately.