The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2009
Filed:
Sep. 30, 2004
Saburo Kanai, Hikari, JP;
Kazue Takahashi, Kudamatsu, JP;
Kouichi Okamura, Tokuyama, JP;
Ryoji Hamasaki, Hikari, JP;
Satoshi Ito, Hikari, JP;
Saburo Kanai, Hikari, JP;
Kazue Takahashi, Kudamatsu, JP;
Kouichi Okamura, Tokuyama, JP;
Ryoji Hamasaki, Hikari, JP;
Satoshi Ito, Hikari, JP;
Hitachi, Ltd, Tokyo, JP;
Abstract
A plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable, arranged inside the outer cylinder, a process gas supply unit for supplying gas to the process chamber, a specimen table for holding a specimen and a vacuum pumping unit. A temperature monitoring unit monitors temperature of the inner cylinder, and a controller controls temperature of the outer cylinder. A desired inner cylinder temperature which is inputted in advance in response to a processing condition of the specimen is compared with the monitored temperature of the inner cylinder, and the controller controls the temperature of the outer cylinder in response to a result of the comparison so as to control the inner cylinder temperature to a predetermined value.