Company Filing History:

16 out of 42,485

Hitachi, Ltd.

patents

3 out of 228

Hitachi Software Engineering Company, Ltd.

patents

where one patent can have more than one assignee

Years Active: 1989-2009

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16 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 7565879 - Plasma processing apparatus (2009-07-28),

2. 7208422 - Plasma processing method (2007-04-24),

3. 7137010 - Method for obtaining a solution of an optimization problem (2006-11-14),

4. 6928402 - Method to support the setup of input parameters (2005-08-09),

5. 5895586 - Plasma processing apparatus and plasma processing method in which a part (1999-04-20),

6. 5874012 - Plasma processing apparatus and plasma processing method (1999-02-23),

7. 5455687 - Method for transferring data between electronic filing systems using (1995-10-03),

8. 5235681 - Image filing system for protecting partial regions of image data of a (1993-08-10),

9. 5231482 - Image filing apparatus and method for thereby encoding and storing (1993-07-27),

10. 5189404 - Display apparatus with rotatable display screen (1993-02-23),

11. 5179649 - Method for generating title information entry format and method for (1993-01-12),

12. 5150458 - Electronic image information filing apparatus displaying editing (1992-09-22),

13. 5128748 - Image processing system and apparatus for processing color documents (1992-07-07),

14. 5030944 - Display apparatus with rotatable display screen (1991-07-09),

15. 5029112 - Image information display system for displaying a plurality of image (1991-07-02),

Title: Satoshi Ito: Innovator in Plasma Processing Technology

Introduction

Satoshi Ito is a prominent inventor based in Odawara, Japan. He has made significant contributions to the field of plasma processing, holding a total of 16 patents. His innovative work has advanced the technology used in various industrial applications.

Latest Patents

Satoshi Ito's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus features a plasma generating unit, a process chamber with an outer cylinder designed to withstand reduced pressure, and an inner cylinder made of non-magnetic material that is replaceable. This apparatus also includes a process gas supply unit, a specimen table for holding specimens, and a vacuum pumping unit. A temperature monitoring unit is integrated to monitor the temperature of the inner cylinder, while a controller adjusts the temperature of the outer cylinder based on a pre-set desired temperature for optimal specimen processing. The plasma processing method utilizes this apparatus, ensuring precise temperature control to achieve desired processing conditions.

Career Highlights

Throughout his career, Satoshi Ito has worked with notable companies such as Hitachi, Ltd. and Hitachi Software Engineering Company, Ltd. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to various innovative projects.

Collaborations

Satoshi Ito has collaborated with esteemed colleagues, including Hidefumi Masuzaki and Saburo Kanai. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Satoshi Ito's contributions to plasma processing technology exemplify his innovative spirit and dedication to advancing industrial applications. His patents and collaborations reflect a commitment to excellence in engineering and technology.

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