Company Filing History:
Years Active: 1999-2009
Title: Kouichi Okamura: Innovator in Plasma Processing Technology
Introduction
Kouichi Okamura is a notable inventor based in Tokuyama, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses and methods.
Latest Patents
Okamura's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus features a plasma generating unit, a process chamber with an outer cylinder designed to withstand reduced pressure, and a replaceable inner cylinder made of non-magnetic material. It also includes a process gas supply unit, a specimen table for holding specimens, and a vacuum pumping unit. A temperature monitoring unit is integrated to monitor the temperature of the inner cylinder, while a controller adjusts the temperature of the outer cylinder based on a pre-set desired temperature for the inner cylinder. This innovative design allows for precise control of the processing conditions.
The plasma processing method utilizes the aforementioned apparatus, where the temperature of the inner cylinder is continuously monitored. The method compares the monitored temperature with a desired temperature inputted in advance, allowing for real-time adjustments to maintain optimal processing conditions.
Career Highlights
Kouichi Okamura is currently employed at Hitachi, Ltd., where he continues to develop and refine plasma processing technologies. His work has been instrumental in advancing the capabilities of plasma processing systems, making them more efficient and reliable for various applications.
Collaborations
Throughout his career, Okamura has collaborated with esteemed colleagues such as Saburo Kanai and Kazue Takahashi. These collaborations have fostered innovation and contributed to the success of various projects within the field.
Conclusion
Kouichi Okamura's contributions to plasma processing technology exemplify his dedication to innovation and excellence. His patents and ongoing work at Hitachi, Ltd. continue to influence the industry and pave the way for future advancements.