The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2005
Filed:
Jul. 01, 2004
Tatehito Usui, Niihari, JP;
Tetsuo Ono, Iruma, JP;
Ryoji Nishio, Mito, JP;
Kazue Takahashi, Kudamatsu, JP;
Nobuyuki Mise, Niihari, JP;
Tatehito Usui, Niihari, JP;
Tetsuo Ono, Iruma, JP;
Ryoji Nishio, Mito, JP;
Kazue Takahashi, Kudamatsu, JP;
Nobuyuki Mise, Niihari, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method and apparatus for measuring a potential difference for plasma processing with a plasma processing apparatus that processes a sample by introducing a gas into a vacuum chamber and generates plasma. A light-emitting portion is formed on a measurement-use sample of the sample to be processed and a current flows into the light-emitting portion according to a potential difference that has been generated across the light-emitting portion. An intensity of light emitted from the light-emitting portion according to a predetermined light intensity is measured and a potential difference on the measurement-use sample according to a predetermined light intensity is measured.