Nobuyuki Mise

Title: Nobuyuki Mise: Innovator in Plasma Processing Technologies

Introduction

Nobuyuki Mise is a prominent inventor based in Niihari, Japan. He has made significant contributions to the field of plasma processing, holding a total of 6 patents. His work focuses on innovative methods and apparatuses that enhance the efficiency and effectiveness of plasma processing technologies.

Latest Patents

Mise's latest patents include groundbreaking advancements such as process monitoring methods in a plasma processing apparatus. This invention involves monitoring units and a sample processing method that utilizes these units. The method and apparatus are designed to measure a potential difference for plasma processing, which processes a sample by introducing gas into a vacuum chamber to generate plasma. A light-emitting portion is formed on a measurement-use sample, allowing for the measurement of light intensity emitted according to a generated potential difference. Another notable patent is an etching method for hardly-etched materials, which involves a film of such material being etched using a mask and plasma. This method allows for the formation of an etched film with a taper angle that meets or exceeds the taper angle of the mask.

Career Highlights

Throughout his career, Nobuyuki Mise has worked with esteemed companies such as Hitachi, Ltd. and Kokusai Electric Co., Ltd. His experience in these organizations has contributed to his expertise in plasma processing technologies and innovation.

Collaborations

Mise has collaborated with notable colleagues, including Tatehito Usui and Tetsuo Ono. These collaborations have further enriched his work and contributed to advancements in the field.

Conclusion

Nobuyuki Mise is a distinguished inventor whose contributions to plasma processing technologies have had a significant impact on the industry. His innovative patents and collaborations reflect his commitment to advancing the field and enhancing processing methods.