The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2008
Filed:
Dec. 27, 2006
Junichi Tanaka, Tsuchiura, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Kazue Takahashi, Kudamatsu, JP;
Junichi Tanaka, Tsuchiura, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Kazue Takahashi, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing method for processing a sample by using plasma on a lot unit basis, including: detecting plural kinds of information as monitor data relating to a processing state of the sample, using a plurality of sensors; selecting a detection time range of the monitor data thus detected; converting the monitor data within the selected detection time range into a converted signal; predicting a pattern shape of the sample based on the converted signal; calculating a correction quantity of a processing parameter, for decreasing a deviation between the predicted pattern shape and a standard value; and converting the correction quantity of a processing parameter obtained by the calculating operation when a kind of a next sample of a next lot is different from the sample, thereby to use a converted correction quantity of the processing parameter for a processing of the next sample.