Company Filing History:

22 out of 42,485

Hitachi, Ltd.

patents

14 out of 2,874

Hitachi-high-technologies Corporation

patents

1 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1990-2019

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36 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10262840 - Plasma processing apparatus (2019-04-16),

2. 9230782 - Plasma processing method and apparatus (2016-01-05),

3. 8992721 - Plasma processing apparatus (2015-03-31),

4. 8900401 - Plasma processing method and apparatus (2014-12-02),

5. 8282849 - Etching process state judgment method and system therefor (2012-10-09),

6. 8083960 - Etching endpoint determination method (2011-12-27),

7. 8038896 - Plasma processing method and apparatus (2011-10-18),

8. 7601240 - Disturbance-free, recipe-controlled plasma processing system and method (2009-10-13),

9. 7376479 - Process monitoring device for sample processing apparatus and control method of sample processing apparatus (2008-05-20),

10. 7343217 - System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation (2008-03-11),

11. 7330346 - Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus (2008-02-12),

12. 7158848 - Process monitoring device for sample processing apparatus and control method of sample processing apparatus (2007-01-02),

13. 7107115 - Method for controlling semiconductor processing apparatus (2006-09-12),

14. 7062347 - Maintenance method and system for plasma processing apparatus (2006-06-13),

15. 7058470 - Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor (2006-06-06),

Title: **Innovations by Shoji Ikuhara: Pioneering Plasma Processing Technologies**

Introduction

Shoji Ikuhara, based in Hikari, Japan, is a prominent inventor known for his significant contributions to the field of plasma processing. With a remarkable portfolio of 36 patents, Ikuhara has been influential in developing technologies that enhance the capabilities and efficiency of plasma processing apparatuses.

Latest Patents

Among Ikuhara's latest innovations are two groundbreaking patents focused on plasma processing apparatuses and methods. The first patent describes a plasma processing apparatus that integrates a monitoring device capable of tracking process quantities generated during plasma processing. This apparatus includes a monitor value estimation unit that utilizes monitor quantity variation models to predict changes in process quantities based on the number of specimens processed. Importantly, it features a control quantity calculation unit that maintains the stability of processed results, even amid variations in processes.

The second patent involves a plasma processing method that efficiently processes multiple substrates using a specialized apparatus. This design incorporates a plasma processing chamber with both an antenna and lower electrode, enabling the effective retention and processing of numerous substrates. The method involves feeding processing gas into the chamber and applying RF power to generate plasma, repeating these steps until the processing of all substrates is complete, thus ensuring optimized performance.

Career Highlights

Throughout his career, Ikuhara has held pivotal positions at prominent companies such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His tenure in these organizations allowed him to refine his expertise in plasma processing technologies and contribute to advanced research and development efforts in the field.

Collaboration

Ikuhara has collaborated with esteemed colleagues, including Hideyuki Yamamoto and Junichi Tanaka. Their joint efforts have bolstered innovation in plasma processing technologies, emphasizing teamwork in driving advancements within research and industry applications.

Conclusion

Shoji Ikuhara has made lasting contributions to plasma processing technology through his inventive spirit and dedication. His latest patents not only represent a commitment to innovation but also signify the potential for enhanced industrial applications. As he continues to pioneer advancements in this field, his work remains pivotal in shaping the future of plasma processing.

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