The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
May. 09, 2003
Hideyuki Yamamoto, Kudamatsu, JP;
Toshio Masuda, Toride, JP;
Shoji Ikuhara, Hikari, JP;
Akira Kagoshima, Kudamatsu, JP;
Junichi Tanaka, Tsuchiura, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Toshio Masuda, Toride, JP;
Shoji Ikuhara, Hikari, JP;
Akira Kagoshima, Kudamatsu, JP;
Junichi Tanaka, Tsuchiura, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
For maintenance after wet cleaning of a plasma processing apparatus which processes a specimen in a vacuum processing chamber by using a plasma, when restoration processing after the wet cleaning of members configuring the vacuum processing chamber is performed with the vacuum processing chamber opened to the atmosphere, it is automatically or semiautomatically judged whether the restoration processing is appropriate or not according to a predetermined optimum sequence inherent in the apparatus, and the next processing is started automatically or semiautomatically according to the results.