The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Feb. 03, 2006
Akira Kagoshima, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Toshio Masuda, Toride, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Junichi Tanaka, Tsuchiura, JP;
Natsuyo Morioka, Tokyo, JP;
Kenji Tamaki, Yokohama, JP;
Akira Kagoshima, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Toshio Masuda, Toride, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Junichi Tanaka, Tsuchiura, JP;
Natsuyo Morioka, Tokyo, JP;
Kenji Tamaki, Yokohama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.