Chiyoda, Japan

Hiroyuki Kitsunai

This inventor holds 31 USPTO granted patents and 1 published patent application, primarily in Plasma Processing. Top assignees: Hitachi, Ltd., Hitachi-High-Technologies Corporation, Hitachi High-Technologies Corpoartion. Active years: 1987-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiroyuki Kitsunai. Retrieved from https://idiyas.com/inventor/hiroyuki-kitsunai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31 

% Patents Active = 80.6

Average Co-Inventor Count = 5.1

ph-index = 8

Forward Citations = 222(Granted Patents)


Location History:

  • Tsuchiura, JP (1987)
  • Chiyoda-machi, JP (2001)
  • Niihari, JP (2003 - 2004)
  • Ibaraki-ken, JP (2005)
  • Ibaraki, JP (1993 - 2006)
  • Chiyoda, JP (2003 - 2009)
  • Kasumigaura, JP (2009 - 2014)
  • Tokyo, JP (2018)

Company Filing History:


Years Active: 1987-2018

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Areas of Expertise:
Plasma Processing
Semiconductor Inspection
Charged Particle Beam
Electron Microscope
Measurement Apparatus
Recipe-Controlled Systems
Process Monitoring
Sample Processing
Specimen Holding
Magnetic Liquid Seal
Etching Treatment
Control Methods
31 patents (USPTO):Explore Patents

Title: Innovation and Ingenuity: The Patents of Hiroyuki Kitsunai

Introduction

Hiroyuki Kitsunai, an inventive mind based in Chiyoda, Japan, has made significant strides in the field of semiconductor technology. With a remarkable portfolio of 31 patents, he has carved a niche for himself in the realms of charged particle beam apparatuses and advanced inspection techniques.

Latest Patents

Among his latest innovations is a charged particle beam apparatus that introduces a sample elevating device capable of responding to diameter increases with lightweight and high rigidity. The device employs first and second lifting mechanisms that rise and fall a sample stage, which directly enhances operational efficiency and precision. This apparatus utilizes innovative deceleration mechanisms that provide controlled drive outputs while maintaining robustness and stability during operations.

Another patently notable achievement from Kitsunai is a measurement and inspecting apparatus tailored for semiconductor samples of varying sizes. This invention addresses the challenge of positional shifts induced by primary electron beam distortions during inspections. By incorporating a potential correcting electrode and dynamically controlling the voltage, Kitsunai's design effectively mitigates issues associated with sample thickness and irradiation conditions.

Career Highlights

Kitsunai has made impactful contributions while working with prominent companies, including Hitachi, Ltd. and Hitachi High-Technologies Corporation. His experience in these reputable organizations has significantly influenced his innovative journey, allowing him to refine his technical acumen and advance the capabilities of semiconductor technology.

Collaborations

Throughout his career, Kitsunai has collaborated with esteemed colleagues such as Junichi Tanaka and Hideyuki Yamamoto, whose collective insights and expertise have enriched many of his research endeavors. This collaborative spirit fosters an environment of shared knowledge and innovation, further driving advancements in the field.

Conclusion

Hiroyuki Kitsunai stands as a testament to the impact that inventive minds can have on technology. His extensive patent portfolio highlights his commitment to innovation and his contributions to the semiconductor industry, showcasing the importance of creativity and collaboration in pushing the boundaries of scientific discovery.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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