The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Feb. 28, 2005
Junichi Tanaka, Tsuchiura, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Akira Kagoshima, Kudamatsu, JP;
Daisuke Shiraishi, Kudamatsu, JP;
Junichi Tanaka, Tsuchiura, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Akira Kagoshima, Kudamatsu, JP;
Daisuke Shiraishi, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A method of processing a semiconductor which includes providing a process gas supply unit for supplying a process gas to a sample stand to hold a sample in a process chamber and to the process chamber, successively supplying a plurality of samples of a lot to the process chamber to conduct an intra-lot successive process, predicting, before a lot process is started and according to sensor data detected by a state sensor to detect a state in the process chamber, intra-lot variation patterns of results of the intra-lot successive process, and changing, according to a result of the prediction by the intra-lot variation pattern prediction unit, a process condition applied to a sample of the lot and conducting the lot process.