The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2007
Filed:
Feb. 17, 2006
Junichi Tanaka, Tsuchiura, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Kazue Takahashi, Kudamatsu, JP;
Junichi Tanaka, Tsuchiura, JP;
Hiroyuki Kitsunai, Chiyoda, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Shoji Ikuhara, Hikari, JP;
Kazue Takahashi, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.