For the Inventor, By the Inventor

Enter assignee name

Carl Zeiss Sms Ltd.

USPTO Granted Patents = 83

% Expired Patents = 16.9

EPO Patents = 15

Forward Citations = 194

Loading Chart...

Loading Chart...

121 inventors (with patents filed for the assignee):

Vladimir Dmitriev (23 out of 27 patents)

Thomas Scheruebl (9 out of 16 patents)

Michael Arnz (9 out of 20 patents)

4. Klaus Edinger (8 out of 33 patents)

5. Thorsten Hofmann (8 out of 18 patents)

6. Michael Totzeck (7 out of 59 patents)

7. Sergey Oshemkov (7 out of 11 patents)

8. Ofir Sharoni (7 out of 6 patents)

9. Guy Ben-Zvi (7 out of 8 patents)

10. Ulrich Stroessner (7 out of 7 patents)

11. Joachim Welte (6 out of 10 patents)

12. Wolfgang Harnisch (6 out of 9 patents)

13. Rainer Becker (5 out of 8 patents)

14. Erez Graitzer (5 out of 5 patents)

15. Elmar Platzgummer (5 out of 55 patents)

Core Competencies:

Photolithography

Mask Inspection

Error Correction

Critical Dimension

Optical Systems

EUV Masks

Microlithography

Aerial Image Simulation

Surface Defect Repair

Electron Beam Induced Etching

Temperature Measurement

Optical Imaging

83 patents: Sort by Forward Citations

1. 11914289 - Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask (2024-02-27),

2. 11774870 - Method for removing a particle from a mask system (2023-10-03),

3. 11385539 - Method and apparatus for compensating defects of a mask blank (2022-07-12),

4. 11366383 - Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask (2022-06-21),

5. 11366382 - Method and apparatus for performing an aerial image simulation of a photolithographic mask (2022-06-21),

6. 11249294 - Optical system and method for correcting mask defects using the system (2022-02-15),

7. 10578975 - Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography (2020-03-03),

8. 10353295 - Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer (2019-07-16),

9. 10157804 - Method and apparatus for determining a critical dimension variation of a photolithographic mask (2018-12-18),

10. 10114294 - Apparatus and method for imparting direction-selective light attenuation (2018-10-30),

11. 10061192 - Method and apparatus for correcting errors on a wafer processed by a photolithographic mask (2018-08-28),

12. 9798249 - Method and apparatus for compensating at least one defect of an optical system (2017-10-24),

13. 9753366 - Method and apparatus for the determination of laser correcting tool parameters (2017-09-05),

14. 9690191 - Surface defect repair by irradiation (2017-06-27),

15. 9658527 - Correction of errors of a photolithographic mask using a joint optimization process (2017-05-23),

Company Overview

Carl Zeiss Sms Ltd., based in Jena, Germany, specializes in the development and manufacturing of advanced photolithography masks essential for semiconductor fabrication. The company focuses on critical technology areas such as mask inspection, error correction, and optical systems, contributing to the precision required in microlithography processes. With expertise in EUV masks and aerial image simulation, Zeiss Sms plays a pivotal role in enhancing the performance and reliability of photolithographic techniques in the semiconductor industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

83 Patents

#5 in Jena

#695 in Germany

#9,158 in the World

Carl Zeiss Sms Ltd.

Forward Citations = 194

121 inventors:

Vladimir Dmitriev (23 out of 27 patents)

Thomas Scheruebl (9 out of 16 patents)

Michael Arnz (9 out of 20 patents)

4. Klaus Edinger (8 out of 33 patents)

5. Thorsten Hofmann (8 out of 18 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Carl Zeiss Sms Ltd.. Retrieved from https://idiyas.com/company/carl-zeiss-sms

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

Loading…