The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2022
Filed:
Feb. 24, 2020
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Carl Zeiss Sms Ltd., Misgav, IL;
Vladimir Dmitriev, Tsurit, IL;
Joachim Welte, Darmstadt, DE;
Bernd Geh, Scottsdale, AZ (US);
Paul Graeupner, Aalen, DE;
Anja Schauer, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Carl Zeiss SMS Ltd, Misgav, IL;
Abstract
The present invention refers to a method for performing an aerial image simulation of a photolithographic mask which comprises the following steps: (a) modifying an optical radiation distribution at a patterned surface of the photolithographic mask, depending on at least one first arrangement of pixels to be generated in the photolithographic mask; and (b) performing the aerial image simulation of the photolithographic mask by using the generated modified optical radiation distribution.