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For the Inventor, By the Inventor

Oberkochen, Germany

Carl Zeiss Smt Gmbh


USPTO Granted Patents = 1,469

% Expired Patents = 23.8


Trademarks = 8

Forward Citations = 2,138

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1,072 inventors (with patents filed for the assignee):

goldMedal Markus Deguenther (105 out of 110 patents)

silverMedal Toralf Gruner (94 out of 131 patents)

bronzeMedal Hans-Juergen Mann (94 out of 119 patents)

4.  Michael Patra (69 out of 71 patents)

5.  Damian Fiolka (62 out of 81 patents)

6.  Jens Kugler (50 out of 63 patents)

7.  Wilhelm Ulrich (48 out of 133 patents)

8.  Heiko Feldmann (46 out of 59 patents)

9.  Markus Hauf (44 out of 62 patents)

10.  Alexander Epple (44 out of 85 patents)

11.  Manfred Maul (43 out of 64 patents)

12.  Norbert Wabra (42 out of 46 patents)

13.  Martin Endres (42 out of 43 patents)

14.  Yim-Bun Patrick Kwan (41 out of 52 patents)

15.  Dirk Heinrich Ehm (40 out of 43 patents)


Core Competencies:
Lithography Apparatus
Optical System
Projection Exposure
EUV Lithography
Interferometry
Optical Element
Mask Repair
Surface Measurement
Image Quality
Microlithography
Measurement System
Vibration Isolator

1,469 patents:

1. 12732678 - Peltier module, assembly, and apparatus for mask inspection (2026-09-08),
2. 12716462 - Vibration isolator for supporting a payload (2026-08-25),
3. 12703100 - Interchangeable-object holding apparatus and method for an euv metrology system (2026-08-11),
4. 12699330 - Method for depositing a cover layer, EUV lithography system and optical element (2026-08-04),
5. 12693594 - Method and apparatus for characterization of a microlithography mask (2026-07-28),
6. 12692603 - Method and apparatus for deposition of at least one layer, optical element and optical arrangement (2026-07-28),
7. 12687792 - Optical system, test device, lithography apparatus, arrangement and method (2026-07-21),
8. 12687786 - Method for operating an optical component, and optical component (2026-07-21),
9. 12687665 - Method for producing a mirror of a microlithographic projection exposure apparatus (2026-07-21),
10. 12681390 - Component of an optical system (2026-07-14),
11. 12681382 - Method and apparatuses for disposing of excess material of a photolithographic mask (2026-07-14),
12. 12681320 - Optical system, in particular for characterizing a microlithography mask (2026-07-14),
13. 12676283 - Method for particle beam-induced processing of a defect of a microlithographic photomask (2026-07-07),
14. 12675042 - Method and apparatus for processing a lithographic mask (2026-07-07),
15. 12670570 - 3D volume inspection method and method of configuring of a 3D volume inspection method (2026-06-30),
Carl Zeiss SMT GmbH is a leading global provider of innovative optical and imaging solutions for the semiconductor manufacturing industry. With a strong focus on precision engineering, Zeiss SMT combines cutting-edge technology with the highest standards of quality to develop advanced microscopy, lithography, and process control systems. Their products enable semiconductor manufacturers to achieve higher productivity, improved yields, and enhanced device performance. Visit the website to learn more about Zeiss SMT's comprehensive portfolio of semiconductor manufacturing technology solutions.
This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Sep 8 2026

Carl Zeiss Smt Gmbh
1,469 Patents

#1 in Oberkochen

#33 in Germany

#665 in the World

Oberkochen, DE
Oberkochen, Germany

Carl Zeiss Smt Gmbh

Forward Citations = 2,138

1,072 inventors:

goldMedal Markus Deguenther (105 out of 110 patents)

silverMedal Toralf Gruner (94 out of 131 patents)

bronzeMedal Hans-Juergen Mann (94 out of 119 patents)

4.  Michael Patra (69 out of 71 patents)

5.  Damian Fiolka (62 out of 81 patents)

Please report any incorrect information to [email protected]
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