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Oberkochen, Germany

Carl Zeiss Smt Gmbh

Calculating rank

USPTO Granted Patents = 1,485

% Expired Patents = 23.6

EPO Patents = 331

Trademarks = 8

Forward Citations = 2,178

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1,085 inventors (with patents filed for the assignee):

Markus Deguenther (105 out of 110 patents)

Toralf Gruner (95 out of 132 patents)

Hans-Juergen Mann (94 out of 119 patents)

4. Michael Patra (69 out of 71 patents)

5. Damian Fiolka (62 out of 81 patents)

6. Jens Kugler (50 out of 63 patents)

7. Wilhelm Ulrich (48 out of 133 patents)

8. Heiko Feldmann (46 out of 59 patents)

9. Alexander Epple (45 out of 87 patents)

10. Markus Hauf (44 out of 62 patents)

11. Norbert Wabra (43 out of 47 patents)

12. Manfred Maul (43 out of 64 patents)

13. Martin Endres (42 out of 43 patents)

14. Yim-Bun Patrick Kwan (42 out of 52 patents)

15. Dirk Heinrich Ehm (40 out of 43 patents)

Core Competencies:

Lithography Apparatus

Optical System

Projection Exposure

EUV Lithography

Interferometry

Optical Element

Mask Repair

Surface Measurement

Image Quality

Microlithography

Measurement System

Vibration Isolator

1,485 patents: Sort by Forward Citations

1. 12775221 - EUV lithography system comprising a gas-binding component in the form of a foil (2026-10-27),

2. 12775215 - Method for measuring an illumination angle distribution on an object field and illumination optics unit having an illumination channel allocation intended therefor (2026-10-27),

3. 12774927 - Temperature measuring device, lithography apparatus and method for measuring a temperature (2026-10-27),

4. 12769217 - Optical element, and assembly and optical system therewith (2026-10-20),

5. 12769216 - Projection exposure apparatus for semiconductor lithography having a connecting element (2026-10-20),

6. 12768804 - Method of 3D volume inspection of semiconductor wafers with increased throughput (2026-10-20),

7. 12761242 - Methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope (2026-10-13),

8. 12760404 - Method for depositing a layer optical element, and optical assembly for the DUV wavelength range (2026-10-13),

9. 12754486 - Screw transmission drive, and reticle stage and measuring device for semiconductor lithography applications (2026-10-06),

10. 12754483 - Mirror, optical system and method for operating an optical system (2026-10-06),

11. 12754470 - Method for electron beam-induced processing of a defect of a microlithographic photomask (2026-10-06),

12. 12748347 - End point determination by means of contrast gas (2026-09-29),

13. 12743022 - Projection lens, projection exposure apparatus and projection exposure method (2026-09-22),

14. 12736885 - Adaptive optical element for microlithography (2026-09-15),

15. 12736773 - Optical element, optical arrangement and insert component (2026-09-15),

Company Overview

Carl Zeiss SMT GmbH, based in Oberkochen, Germany, specializes in advanced lithography systems essential for semiconductor manufacturing. The company is renowned for its expertise in optical systems and projection exposure technologies, including EUV lithography, which plays a critical role in producing smaller and more efficient microchips. Their innovations extend to interferometry, optical elements, mask repair, and surface measurement, positioning them as a leader in precision optics and metrology solutions for the semiconductor industry.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

1,485 Patents

#1 in Oberkochen

#33 in Germany

#663 in the World

Oberkochen, Germany

Carl Zeiss Smt Gmbh

Forward Citations = 2,178

1,085 inventors:

Markus Deguenther (105 out of 110 patents)

Toralf Gruner (95 out of 132 patents)

Hans-Juergen Mann (94 out of 119 patents)

4. Michael Patra (69 out of 71 patents)

5. Damian Fiolka (62 out of 81 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Carl Zeiss Smt Gmbh. Retrieved from https://idiyas.com/company/carl-zeiss-smt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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