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Oberkochen, Germany

Carl Zeiss Smt Gmbh

USPTO Granted Patents = 1,410

EPO Patents = 315

Trademarks = 10

Forward Citations = 2,005

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1,009 inventors (with patents filed for the assignee):

Markus Deguenther (104 out of 109 patents)

Hans-Juergen Mann (94 out of 119 patents)

Toralf Gruner (91 out of 128 patents)

4. Michael Patra (67 out of 69 patents)

5. Damian Fiolka (62 out of 81 patents)

6. Jens Kugler (49 out of 62 patents)

7. Wilhelm Ulrich (48 out of 133 patents)

8. Heiko Feldmann (45 out of 58 patents)

9. Markus Hauf (44 out of 62 patents)

10. Alexander Epple (44 out of 84 patents)

11. Manfred Maul (43 out of 64 patents)

12. Norbert Wabra (42 out of 46 patents)

13. Martin Endres (41 out of 42 patents)

14. Yim-Bun Patrick Kwan (41 out of 52 patents)

15. Boris Bittner (39 out of 40 patents)

Core Competencies:

EUV Lithography

Optical System

Projection Exposure Apparatus

Microlithography

Measurement Method

Optical Assembly

Reflective Optical Element

Interferometry

Digital Micromirror Device

Vibration Damping

Charged Particle Beam System

Surface Shape Characterization

1,410 patents: Sort by Forward Citations

1. 12510692 - Protection of optical materials of optical components from radiation degradation (2025-12-30),

2. 12504698 - Mounting for a lithography system, and lithography system (2025-12-23),

3. 12498541 - Assembly having a decoupling joint for mechanically mounting an element (2025-12-16),

4. 12493238 - Method, device and computer program for repairing a mask defect (2025-12-09),

5. 12492963 - Method for determining an imaging quality of an optical system when illuminated by illumination light within an entrance pupil to be measured (2025-12-09),

6. 12468230 - Optical component and optical system, in particular for microlithography (2025-11-11),

7. 12468228 - Illumination optical system for EUV projection lithography (2025-11-11),

8. 12468115 - Filter assembly, in particular for a control loop for controlling the position of at least one element (2025-11-11),

9. 12443110 - Optical assembly, method for controlling an optical assembly, and projection exposure apparatus (2025-10-14),

10. 12443109 - EUV collector (2025-10-14),

11. 12436473 - Optical element, optical system, lithography system, and method for operating an optical element (2025-10-07),

12. 12436361 - Projection exposure apparatus for semiconductor lithography (2025-10-07),

13. 12422756 - Optical system, in particular lithography system (2025-09-23),

14. 12422743 - Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method (2025-09-23),

15. 12416865 - Optical system, in particular for microlithography, and method for operating an optical system (2025-09-16),

Carl Zeiss SMT GmbH is a leading global provider of innovative optical and imaging solutions for the semiconductor manufacturing industry. With a strong focus on precision engineering, Zeiss SMT combines cutting-edge technology with the highest standards of quality to develop advanced microscopy, lithography, and process control systems. Their products enable semiconductor manufacturers to achieve higher productivity, improved yields, and enhanced device performance. Visit the website to learn more about Zeiss SMT's comprehensive portfolio of semiconductor manufacturing technology solutions.

This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 30 2025

1,410 Patents

#1 in Oberkochen

#37 in Germany

#682 in the World

Oberkochen, Germany

Carl Zeiss Smt Gmbh

Forward Citations = 2,005

1,009 inventors:

Markus Deguenther (104 out of 109 patents)

Hans-Juergen Mann (94 out of 119 patents)

Toralf Gruner (91 out of 128 patents)

4. Michael Patra (67 out of 69 patents)

5. Damian Fiolka (62 out of 81 patents)

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