The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Jul. 27, 2023
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Gilles Tabbone, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/20 (2012.01); G03F 7/00 (2006.01); H01J 37/22 (2006.01); H01J 37/28 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
G03F 1/20 (2013.01); G03F 7/7065 (2013.01); G03F 7/70655 (2023.05); G03F 7/706837 (2023.05); G03F 7/706839 (2023.05); H01J 37/222 (2013.01); H01J 37/28 (2013.01); H01J 37/30 (2013.01); H01J 2237/04735 (2013.01); H01J 2237/24585 (2013.01);
Abstract
A method for electron beam-induced processing of a defect of a microlithographic photomask, including the steps of:
Quick Actions:
Tabbone, Gilles. (2026). Method for electron beam-induced processing of a defect of a microlithographic photomask (U.S. Patent No. 12754470). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12754470
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile