The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Sep. 18, 2023
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Eduard Schweigert, Syrgenstein, DE;

Stefan Hembacher, Bobingen, DE;

Soeren Knorr, Aalen, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 7/195 (2021.01); G02B 7/18 (2021.01); G03F 7/00 (2006.01); G02B 5/08 (2006.01);
U.S. Cl.
CPC ...
G02B 7/1815 (2013.01); G03F 7/7015 (2013.01); G03F 7/70891 (2013.01); G02B 5/0891 (2013.01);
Abstract

An optical element for reflecting radiation, such as EUV radiation, comprises: a substrate; a reflective coating applied to a surface of the substrate; a plurality of cooling channels, which run in the substrate below the surface on which the reflective coating is applied; a distributor for connecting at least one cooling fluid inlet to the plurality of cooling channels; and a collector for connecting the plurality of cooling channels to at least one cooling fluid outlet. The distributor and/or the collector are integrated into at least one, optionally rod-like insert component which is introduced into at least one cavity formed in the substrate. An optical arrangement, such as an EUV lithography system, comprises: at least one optical element formed in the manner described further above; and a cooling device which is designed for the flowing of a cooling fluid through the plurality of cooling channels.


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