Oberkochen, Germany

Damian Fiolka

This inventor holds 81 USPTO granted patents and 13 published patent applications and 13 EPO patents, primarily in Microlithography Systems (CPC class G03F7-70116). Top assignees: Carl Zeiss Smt Gmbh, Carl-Zeiss-Smt Ag, Asml Netherlands B.v.. Active years: 2007-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Damian Fiolka. Retrieved from https://idiyas.com/inventor/damian-fiolka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 81 

% Patents Active = 50.6

 

Average Co-Inventor Count = 2.5

ph-index = 14

Forward Citations = 497(Granted Patents)

Forward Citations (Not Self Cited) = 442(Dec 10, 2025)


Inventors with similar research interests:

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Company Filing History:


Years Active: 2007-2018

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Areas of Expertise:
Microlithography
Illumination Systems
Projection Exposure Apparatus
Optical Elements
Multi-Mirror Arrays
Polarization-Modulating
EUV Lithography
Birefringent Elements
Optical Systems
Measurement Methods
Thermal Stabilization
Facet Mirrors
81 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Damian Fiolka:

Title: Innovator Spotlight - Damian Fiolka: Pioneering Inventor in Microlithographic Projection Systems

Introduction:

Damian Fiolka, a prolific inventor based in Oberkochen, DE, has made significant contributions to the field of microlithographic projection systems. With an impressive portfolio of 81 patents, Damian is at the forefront of innovation in the industry.

Latest Patents:

1. Illumination system of a microlithographic projection exposure apparatus with a birefringent element: Damian's latest patent focuses on an illumination system that utilizes a mirror arrangement with multiple mirror units and elements to manipulate the polarization states of light for precise control over the angle distribution. This innovation enhances the performance of microlithographic projection systems.

2. Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilization: Another groundbreaking patent by Damian introduces a microlithography projection exposure apparatus featuring a multi-mirror array to adjust intensity distribution in exit pupils. The system incorporates temporal modifications for enhanced stability, achieved through an innovative optical system with adjustable mirror surfaces.

Career Highlights:

Damian Fiolka has garnered experience and expertise through his tenure at renowned companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His innovative spirit and dedication to advancing technology have been instrumental in shaping the future of microlithographic projection systems.

Collaborations:

During his career, Damian has collaborated closely with esteemed colleagues such as Manfred Maul and Markus Deguenther. Together, they have shared insights, expertise, and creative solutions that have led to groundbreaking inventions in the field.

Conclusion:

In conclusion, Damian Fiolka stands out as a visionary inventor in the realm of microlithographic projection systems. With a remarkable patent portfolio and a proven track record of innovation, Damian continues to push the boundaries of technology and inspire advancements in the industry.

If you would like more information or details on Damian Fiolka's inventions, patents, or collaborations, please feel free to explore our website idiyas.com for further insights.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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