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Veldhoven, Netherlands

Asml Holding N.v.

USPTO Granted Patents = 618

EPO Patents = 25

Forward Citations = 3,224

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529 inventors (with patents filed for the assignee):

Harry Sewell (59 out of 63 patents)

Justin Lloyd Kreuzer (49 out of 64 patents)

Daniel Nicholas Galburt (37 out of 52 patents)

4. Stephen Roux (35 out of 40 patents)

5. Santiago E Del Puerto (27 out of 33 patents)

6. Azat M Latypov (27 out of 45 patents)

7. Herman Vogel (26 out of 32 patents)

8. Stanislav Y Smirnov (26 out of 30 patents)

9. Peter Conrad Kochersperger (25 out of 26 patents)

10. Louis John Markoya (24 out of 25 patents)

11. Matthew Lipson (23 out of 29 patents)

12. Yevgeniy Konstantinovich Shmarev (20 out of 22 patents)

13. Lev Ryzhikov (20 out of 25 patents)

14. Roberto B Wiener (20 out of 20 patents)

15. Joseph Harry Lyons (20 out of 24 patents)

Core Competencies:

Wafer Alignment

Lithographic Apparatus

Metrology Systems

Contaminant Detection

Optical Designs

Submicron Particle Detection

Electrostatic Clamp

Overlay Measurement

Self-Referencing Interferometer

Illumination Sources

Particle Inspection

Cleaning Systems

618 patents: Sort by Forward Citations

1. 12487081 - On chip wafer alignment sensor (2025-12-02),

2. 12474647 - Generating an alignment signal based on local alignment mark distortions (2025-11-18),

3. 12474633 - Pod handling systems and methods for a lithographic device (2025-11-18),

4. 12442759 - Contaminant analyzing metrology system, lithographic apparatus, and methods thereof (2025-10-14),

5. 12429780 - Multiple objectives metrology system, lithographic apparatus, and methods thereof (2025-09-30),

6. 12405535 - Method for filtering an image and associated metrology apparatus (2025-09-02),

7. 12405227 - Method for region of interest processing for reticle particle detection (2025-09-02),

8. 12399000 - Systems and methods for measuring intensity in a lithographic alignment apparatus (2025-08-26),

9. 12393126 - Sub micron particle detection on burl tops by applying a variable voltage to an oxidized wafer (2025-08-19),

10. 12393046 - Metrology systems, coherence scrambler illumination sources and methods thereof (2025-08-19),

11. 12386270 - Mode control of photonic crystal fiber based broadband radiation sources (2025-08-12),

12. 12379655 - Contaminant identification metrology system, lithographic apparatus, and methods thereof (2025-08-05),

13. 12339583 - Optimization using a non-uniform illumination intensity profile (2025-06-24),

14. 12332570 - Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris (2025-06-17),

15. 12326670 - Lithographic apparatus, metrology system, and intensity imbalance measurement for error correction (2025-06-10),

ASML Holding N.V. is a Dutch multinational company specializing in manufacturing photolithography systems used in the semiconductor industry. Their products enable the production of integrated circuits, including microchips, used in a wide range of electronic devices. ASML's advanced lithography machines are vital for creating the extremely small and precise features on silicon wafers. With their innovative technologies, ASML strives to push the boundaries of what is possible in the field of chip-making, enabling faster, more powerful, and energy-efficient devices. For more information, please visit their official website.

This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 30 2025

618 Patents

#2 in Veldhoven

#17 in Netherlands

#1,554 in the World

Veldhoven, Netherlands

Asml Holding N.v.

Forward Citations = 3,224

529 inventors:

Harry Sewell (59 out of 63 patents)

Justin Lloyd Kreuzer (49 out of 64 patents)

Daniel Nicholas Galburt (37 out of 52 patents)

4. Stephen Roux (35 out of 40 patents)

5. Santiago E Del Puerto (27 out of 33 patents)

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