Inventors with similar research interests:
Location History:
- Wilton, CT (US) (2004)
- Haviland, CT (US) (2005)
- Ridgefild, CT (US) (2014)
- Ridgefield, CT (US) (1990 - 2020)
Company Filing History:
Years Active: 1990-2020
Areas of Expertise:
Title: The Innovator Extraordinaire: Harry Sewell
Introduction:
Harry Sewell, a brilliant inventor based in Ridgefield, CT (US), is a trailblazer in the field of immersion lithography. With an astounding 63 patents to his name, Sewell has revolutionized the way surfaces are dried and wetted, particularly the top surface of substrates.
Latest Patents:
Among his latest patents is a groundbreaking Lithographic apparatus and method of removing liquid from a surface. This innovation involves a novel approach to drying and wetting surfaces, utilizing a single-phase extractor and priming liquid delivery to enhance the immersion lithography process.
Career Highlights:
Throughout his illustrious career, Sewell has made significant contributions to the industry while working with prestigious companies like ASML Holding N.V. and ASML Netherlands B.V. His expertise and innovative spirit have propelled him to the forefront of technological advancements in lithography.
Collaborations:
Sewell has collaborated with esteemed professionals in the field, including Louis John Markoya and Diane Czop McCafferty. Together, they have pushed the boundaries of innovation and paved the way for cutting-edge developments in the industry.
Conclusion:
In conclusion, Harry Sewell stands as a beacon of innovation, with his groundbreaking patents and dedicated work in the field of immersion lithography. His contributions have not only transformed the way surfaces are treated but have also inspired a new wave of creativity and advancement in the industry.