Ridgefield, CT, United States of America

Harry Sewell

USPTO Granted Patents = 63 


Average Co-Inventor Count = 1.8

ph-index = 10

Forward Citations = 797(Granted Patents)

Forward Citations (Not Self Cited) = 755(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Wilton, CT (US) (2004)
  • Haviland, CT (US) (2005)
  • Ridgefild, CT (US) (2014)
  • Ridgefield, CT (US) (1990 - 2020)

Company Filing History:


Years Active: 1990-2020

Loading Chart...
Loading Chart...
Areas of Expertise:
Lithographic Apparatus
EUV Mask Inspection
Immersion Lithography
Thermally-Induced Aberration Correction
Tunable Wavelength Illumination
Interferometric Lithography
Double Patterning Process
Liquid Immersion Lithography
Maskless Optical Writer
Nanodisk Formation
Phase Shift Mask Imaging
Patterning Techniques
63 patents (USPTO):Explore Patents

Title: The Innovator Extraordinaire: Harry Sewell

Introduction:

Harry Sewell, a brilliant inventor based in Ridgefield, CT (US), is a trailblazer in the field of immersion lithography. With an astounding 63 patents to his name, Sewell has revolutionized the way surfaces are dried and wetted, particularly the top surface of substrates.

Latest Patents:

Among his latest patents is a groundbreaking Lithographic apparatus and method of removing liquid from a surface. This innovation involves a novel approach to drying and wetting surfaces, utilizing a single-phase extractor and priming liquid delivery to enhance the immersion lithography process.

Career Highlights:

Throughout his illustrious career, Sewell has made significant contributions to the industry while working with prestigious companies like ASML Holding N.V. and ASML Netherlands B.V. His expertise and innovative spirit have propelled him to the forefront of technological advancements in lithography.

Collaborations:

Sewell has collaborated with esteemed professionals in the field, including Louis John Markoya and Diane Czop McCafferty. Together, they have pushed the boundaries of innovation and paved the way for cutting-edge developments in the industry.

Conclusion:

In conclusion, Harry Sewell stands as a beacon of innovation, with his groundbreaking patents and dedicated work in the field of immersion lithography. His contributions have not only transformed the way surfaces are treated but have also inspired a new wave of creativity and advancement in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…