The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Mar. 16, 2010
Harry Sewell, Ridgefield, CT (US);
Mircea Dusa, Campbell, CA (US);
Richard Johannes Franciscus Van Haren, Waalre, NL;
Manfred Gawein Tenner, Eindhoven, NL;
Maya Angelova Doytcheva, Eindhoven, NL;
Harry Sewell, Ridgefield, CT (US);
Mircea Dusa, Campbell, CA (US);
Richard Johannes Franciscus Van Haren, Waalre, NL;
Manfred Gawein Tenner, Eindhoven, NL;
Maya Angelova Doytcheva, Eindhoven, NL;
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).