IDiyas

For the Inventor, By the Inventor

Veldhoven, Netherlands

Asml Netherlands B.v.


USPTO Granted Patents = 4,883



Trademarks = 43

Forward Citations = 24,341

Loading Chart...
Loading Chart...

3,586 inventors (with patents filed for the assignee):

goldMedal Erik Roelof Loopstra (312 out of 335 patents)

silverMedal Arie Jeffrey Den Boef (246 out of 249 patents)

bronzeMedal Sjoerd Nicolaas Lambertus Donders (229 out of 231 patents)

4.  Johannes Catharinus Hubertus Mulkens (199 out of 200 patents)

5.  Christiaan Alexander Hoogendam (194 out of 195 patents)

6.  Vadim Yevgenyevich Banine (189 out of 192 patents)

7.  Bob Streefkerk (187 out of 188 patents)

8.  Hans Butler (151 out of 152 patents)

9.  Jeroen Johannes Sophia Maria Mertens (150 out of 151 patents)

10.  Johannes Jacobus Matheus Baselmans (143 out of 147 patents)

11.  Nicolaas Ten Kate (139 out of 141 patents)

12.  Martinus Hendrikus Antonius Leenders (126 out of 126 patents)

13.  Maurits Van Der Schaar (124 out of 124 patents)

14.  Joost Jeroen Ottens (123 out of 124 patents)

15.  Hans Jansen (121 out of 121 patents)


Core Competencies:
Lithographic Apparatus
EUV Lithography
Metrology Method
Charged Particle Assessment
Wavefront Metrology
Patterning Process
Optical Measurements
Machine Learning
Alignment Techniques
Contaminant Analysis
Cooling Hood
Subresolution Assist Features

4,883 patents:

1. 12481226 - Interferometer system, positioning system, a lithographic apparatus, a jitter determination method, and a device manufacturing method (2025-11-25),
2. 12476075 - Stack alignment techniques (2025-11-18),
3. 12476069 - Charged particle assessment tool, inspection method (2025-11-18),
4. 12474647 - Generating an alignment signal based on local alignment mark distortions (2025-11-18),
5. 12474645 - Object table, stage apparatus, holding method and lithographic apparatus (2025-11-18),
6. 12474642 - Metrology method for measuring an etched trench and associated metrology apparatus (2025-11-18),
7. 12474632 - Pellicle frame for EUV lithography (2025-11-18),
8. 12474629 - Membrane for EUV lithography (2025-11-18),
9. 12474267 - Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses (2025-11-18),
10. 12469674 - Photo-electrical evolution defect inspection (2025-11-11),
11. 12469669 - Printed circuit board for sealing vacuum system (2025-11-11),
12. 12469668 - Systems and methods for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus (2025-11-11),
13. 12468235 - Method and apparatus to determine a patterning process parameter (2025-11-11),
14. 12468234 - Method of controlling a patterning process, device manufacturing method (2025-11-11),
15. 12468232 - Etch bias characterization and method of using the same (2025-11-11),
ASML is one of the world's leading manufacturers of chip-making equipment. With over 60 years of industry experience, ASML develops, produces, and integrates advanced systems used by the world's top semiconductor manufacturers. Their technology enables the production of smaller, more powerful, and energy-efficient chips. ASML is headquartered in Veldhoven, Netherlands, and operates globally with R&D and manufacturing facilities in Europe, the United States, and Asia.
This text is generated by artificial intelligence and may not be accurate.

logo

Company Badge

USPTO Data Jan 1 1976 - Dec 2 2025

...
4,883 Patents

#1 in Veldhoven

#3 in Netherlands

#183 in the World

...
Veldhoven, Netherlands

Asml Netherlands B.v.

Forward Citations = 24,341

3,586 inventors:

goldMedal Erik Roelof Loopstra (312 out of 335 patents)

silverMedal Arie Jeffrey Den Boef (246 out of 249 patents)

bronzeMedal Sjoerd Nicolaas Lambertus Donders (229 out of 231 patents)

4.  Johannes Catharinus Hubertus Mulkens (199 out of 200 patents)

5.  Christiaan Alexander Hoogendam (194 out of 195 patents)

Please report any incorrect information to support@idiyas.com
Loading…